Document Type
Patent
Publication Date
December 2008
Patent Number
7468238
Abstract
The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using photoreactive chemicals. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator uses a plasma display device to generate and direct patterned light onto a target object. Specifically, the invention provides a maskless photolithography system and method for creating molecular imprinted array devices, integrated microsensors and fluidic networks on a substrate, integrated circuits of conducting polymers, and patterns on substrates using photochemical vapor deposition. For creating molecular imprinted array devices, the invention provides a system and method for applying a photoreactive reagent comprising photopolymer receptors and extractable target compounds, exposing the substrate to patterned light to activate the photopolymer to form molecular imprints of the target compounds corresponding to the pattern of incident light. For creating integrated circuits of conducting polymers, the invention provides a system and method for applying a photoreactive conducting polymer reagent to a substrate, exposing the substrate to patterned light to activate the photoreactive conducting polymer reagent to form integrated circuits corresponding to the circuit pattern of incident light. In an embodiment the substrate is a photoreactive conductive polymer. For creating integrated microsensors and fluidic networks on a substrate, the invention provides a system and method for applying a photoreactive sensor creating compound and a photoreactive fluid channel creating compound to a substrate, exposing the substrate to patterned light to activate the photoreactive compounds to form microsensor arrays and fluidic networks corresponding to the pattern of incident light. For creating patterns on substrates using photochemical vapor deposition, the invention provides a system and method for exposing a substrate to photoreactive gases and patterned light to deposit chemicals on the substrate corresponding to the pattern of incident light.
Application Number
11/297,695
Recommended Citation
Fries, David P., "Maskless photolithography for using photoreactive agents" (2008). USF Patents. 617.
https://digitalcommons.usf.edu/usf_patents/617
Assignees
University of South Florida
Filing Date
12/08/2005
Primary/U.S. Class
430/320
