Document Type
Patent
Publication Date
November 2009
Patent Number
7622239
Abstract
A method for making a patterned SiO2 films over TiO2 (Si02/Ti02) under ambient atmospheric conditions, including room temperature, through photo and chemical reactions. The method is simple, convenient and can be performed in a short period of time, typically less than two hours. The patterned TiO2 film is fabricated through photo-irradiation of a photosensitive organic-titanium film using a mask. Silica particles are generated from silicate solution by adjusting pH values to 10 to 8 with hydrochloric acid. The pre-deposited TiO2 film has a strong attraction for the SiO2 particles, leading to the instant formation of SiO2 film over the TiO2 film. The silica films are also amino-silylated with 3-aminopropyltriethoxysilane toward applications such as patternable, location-specific silica-based separation and purification.
Application Number
11/539,987
Recommended Citation
Ding, Xiaoling and Fries, David P., "Micro-patterned SiO2/TiO2 films through photo and chemical reactions" (2009). USF Patents. 577.
https://digitalcommons.usf.edu/usf_patents/577
Assignees
University of South Florida
Filing Date
10/10/2006
Primary/U.S. Class
430/269
