Document Type

Patent

Publication Date

June 2011

Patent Number

7958906

Abstract

In accordance with an embodiment of the present invention, a thermally induced single-use valve is provided including a silicon wafer having a top surface and a bottom surface and at least one cavity formed in the bottom surface of the wafer, a thermally deformable membrane suspended across the cavity on the top surface of the wafer and at least one resistive element patterned on top of the thermally deformable membrane.

Application Number

11/734,090

Assignees

University of South Florida

Filing Date

04/11/2007

Primary/U.S. Class

137/72

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