Document Type

Article

Publication Date

December 2023

Patent Number

11844966

CPC

A62B 23/02 , A62B 18/025 , A62B 18/10 , A62B 9/02 , A62B 7/12 , A62B 7/10 , B01J 35/004 , A61L 2209/111 , A61L 2209/12 , A61L 2209/14

Abstract

A breathing system for removing harmful contaminants, such as microbes and volatile organic compounds, is provided. The breathing system includes a face mask, an inhalation limb, and a plasmonic device. As a contaminated gas flows through an internal chamber of the plasmonic device, the contaminates are oxidized. Specifically, the internal chamber includes a source of photons spaced apart from the nanostructure. The nanostructure is coated in a plasmonic layer, including noble metal nanoparticles. The plasmonic layer is protected from oxidation through a photocatalyst layer disposed thereon.

Application Number

17/249503

Assignees

University of South Florida

Filing Date

03/03/2021

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