Document Type

Patent

Publication Date

January 2019

Patent Number

10180624

CPC

H01L 2924/00, H01L 2924/00014, H01L 2224/48091, H01L 2224/45015, H01L 2224/32225, H01L 2924/00012, H01L 2224/48227, H01L 2224/73265, H01L 2224/45014, H01L 2224/45144, H01L 2924/15311, H01L 2224/45124, H01L 2224/45147, G01R 1/06716, G01R 1/07307, G01R 1/0466, B81B 7/007, B81B 2207/07, B81B 2201/0235, B81B 2201/0242, B81B 2203/053, B81B 3/0018, B81B 7/0048, B81B 7/0058, B81B 7/0061, B81B 7/0064, H05K 1/141, H05K 1/185, H05K 2201/10568, H05K 3/3447, H05K 1/0219, H05K 1/0306, H05K 1/111, H05K 1/189, H05K 2201/0367, H05K 2201/09045, H05K 2201/09781, H05K 2201/10106, H05K 2201/10121, H05K 2201/10659, H05K 2201/10674, H05K 2201/10734, H05K 2201/2036, H05K 2203/167, H05K 3/303, H05K 3/325, H05K 3/3442, H05K 1/021, H05K 1/0216, H05K 1/023, H05K 1/0263, H05K 1/0284, H05K 1/0298, H05K 1/113, H05K 1/115, H05K 1/118, H05K 1/147, H05K 2201/0133, H05K 2201/0187, H05K 2201/0355, H05K 2201/0394, H05K 2201/049, H05K 2201/0715, H05K 2201/09036, H05K 2201/09063, H05K 2201/09081, H05K 2201/0919, H05K 2201/09236, H05K 2201/09381, H05K 2201/094, H05K 2201/09436, H05K 2201/09472, H05K 2201/09745, H05K 2201/0979, H05K 2201/09809, H05K 2201/10022, H05K 2201/10083, H05K 2201/10166, H05K 2201/10386, H05K 2201/10454, H05K 2201/10666, H05K 2201/10719, H05K 2201/10727, H05K 2201/10916, H05K 2201/10969, H05K 2203/0195, H05K 2203/0278, H05K 2203/0285, H05K 2203/0369, H05K 2203/0542, H05K 2203/082, H05K 2203/1115, H05K 2203/1147, H05K 2203/1469, H05K 2203/306, H05K 3/0052, H05K 3/0061, H05K 3/242, H05K 3/243, H05K 3/305, H05K 3/306, H05K 3/308, H05K 3/321, H05K 3/326, H05K 3/328, H05K 3/341, H05K 3/3452, H05K 3/3494, H05K 3/366, H05K 3/368, H05K 3/383, H05K 3/4007, H05K 3/403, H05K 3/429, H05K 3/4605, H05K 3/4652, H05K 3/4682, H05K 5/0047, H05K 7/1061, H05K 7/1461, H05K 7/20545, H05K 7/209, H05K 7/20927, H05K 9/0049, H05K 3/3436

Abstract

In one embodiment, a method for fabricating thin film tunneling devices using a mask set includes depositing a first layer of material on a substrate, positioning a first photomask over the substrate, exposing the first layer to light that passes through the first photomask, depositing a second layer of material on the substrate, positioning a second photomask over the substrate by aligning a corner marker provided on the second photomask with one of multiple corner markers provided on the first photomask, wherein the corner marker of the first photomask with which the corner marker of the second photomask aligns defines a degree of overlap between a first structure formed using the first photomask and a second structure formed using the second photomask; and exposing the second layer to light that passes through the second photomask.

Application Number

15/719998

Assignees

University of South Florida

Filing Date

09/29/2017

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